Wafer Macro/Micro Inspection Equipment (KMM-321)

Features

• Wafer macro and micro dual inspection functions
• Macro inspection: Rotate the wafer in two axis with max ±45 degree by joystick and record the defect image and position
• Micro inspection: 1000X microscope with CCD camera to record the defect image and position
• Multiple wafer carrier loaders: Coin Stack Wafer Box and FOSB
• Multiple inspection processes: set the process flows according to the recipe
• Built-in wafer buffer station, continuous inspection without clogging

Performance

• Wafer transfer time
  
  <60 Seconds
• Stage movement accuracy
  
  ±2um
• Cleanliness
  
  ISO Class 4
  (FS-209E Class 10)

Wafer Macro/Micro Inspection Equipment (KMM-332)

Features

• Wafer macro and micro dual inspection functions
• Macro inspection: Rotate the wafer in two axis with max ±45 degree by joystick and record the defect image and position
• Micro inspection: 1000X microscope with CCD camera to record the defect image and position
• Multiple wafer carrier loaders: 3 Coin Stack Boxes and 1 FOSB
• Multiple inspection processes: set the process flows according to the recipe
• Built-in wafer buffer station, continuous inspection without clogging
• Dual robots for high speed wafer transfer

Performance

• Wafer transfer time
  
  <30 Seconds
• Stage movement accuracy
  
  ±2um
• Cleanliness
  
  ISO Class 4
  (FS-209E Class 10)